Mo-Nb Alloy Sputtering Targets Japan & USA Patent Approved

Product Detail

Molybdenum Niobium alloy sputtering target




Baoji Kedipu New Material Co., Ltd manufactures and supplies high quality Molybdenum and Niobium alloy plate, sheet and sputtering targets. We've been granted the Japanese, Chinese and American Patents in making Molybdenum Niobium alloy.




Background

In the past, ITO targets took the most market share in FPD Industry. Among many others, Mo alloy and Cr alloy developed by Hitachi dominated. Recently, Many companies has begun to replace ITO, IMO and ZAO by Mo-Nb and Mo-Ta alloy. In Chinese market, Mo-Nb alloy is irreplaceable and is being recognized by most consumers.

 

As the targets imported from Japan and Austria is very expensive, Most Chinese companies are choosing Mo-Nb alloy target from Baoji Kedipu New Material Co., Ltd.

 

In 2012, Baoji Kedipu had supplied 11 tons of targets for Chinese Market. In 2013, We have produced 14 metric tons. In 2017, our predicted output would be around 40 tons.

 

We can manufacture all kinds of Mo-Nb targets as per customer’s drawings.

Molybdenum Niobium Alloys are widely used in:

-Flat Panel Display (FPD)
-Semiconductor
-Aviation and aerospace
-Nuclear
-High temperature assemblies

Packaging for Molybdenum Niobium Alloy:

Molybdenum Niobium Alloy is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
































 







Rotatable / Cylinderical Molybdenum sputtering target for Touch Panel






Mechanical Properties

Purity	Density	Coefficient of thermal expansion	Thermal conductivity	Electrical conductivity	Microstructure
99.95%	9.6-9.7g/cm3	5.38   ppm/K	103   W/(m•K)	13.5   MS/m	Single phase, without oxide


Chemical composition

Element	Mo+Nb	C	N	O	Si	Fe	Al	Cu	Ni
%	Balance	0.004	0.001	0.081	<0.002	<0.005	<0.002	<0.001	<0.003